Millimeter-wave measurements of the complex dielectric constant of an advanced thick film UV photoresist

Collins, C.E., Miles, R.E., Pollard, R. D., Steenson, D.P., Digby, J.W., Parkhurst, G.M., Chamberlain, J.M., Cronin, N.J., Davies, S.R. and Bowen, J. W. (1998) Millimeter-wave measurements of the complex dielectric constant of an advanced thick film UV photoresist. Journal of Electronic Materials, 27 (6). L40-L42. ISSN 0361-5235 doi: 10.1007/s11664-998-0059-6

Abstract/Summary

The first measurement of the relative permittivity (εr) and loss tangent (tan δ) of EPON™ SU-8 advanced thick film ultraviolet photoresist is reported at frequencies between 75–110 GHz (W-band). The problems associated with such a measurement are discussed, an error analysis given, and values of εr=1.725±0.08 and tanδ =0.02±0.001 are determined.

Item Type	Article
URI	https://reading-clone.eprints-hosting.org/id/eprint/18900
Item Type	Article
Refereed	Yes
Divisions	Life Sciences > School of Biological Sciences > Department of Bio-Engineering
Uncontrolled Keywords	Complex permittivity, dielectric constant measurement, micromachining, millimeter wave, negative photoresist
Publisher	Springer
Download/View statistics	View download statistics for this item